Berlin 2015 – wissenschaftliches Programm
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HL: Fachverband Halbleiterphysik
HL 76: Carbon nanotubes
HL 76.2: Vortrag
Donnerstag, 19. März 2015, 11:45–12:00, EW 015
Optimizing Dispersion Preparation for the Wafer-Level Deposition of CNTs — •Toni Hille1,2, Thomas Blaudeck1, Sascha Hermann1,3, and Stefan E. Schulz1,2,3 — 1Technische Universität Chemnitz, Zentrum für Mikrotechnologien, 09107 Chemnitz, Germany — 2Fraunhofer-Institut für Elektronische Nanosysteme (ENAS), 09126 Chemnitz, Germany — 3DFG Cluster of Excellence "Center for Advancing Electronics Dresden" (cfaed), Carbon Path, 09107 Chemnitz
In this work, we show systematic studies on the CNT dispersion preparation comprising homogenization, ultrasonication, and centrifugation and their optimal parameters for the wafer-level fabrication of CNT-FETs as building blocks of high-frequency and sensor components. With an in-situ monitoring of the optical absorption, a detailed analysis of the dispersion process for different surfactants (sodium lauryl sulfate, sodium deoxycholate, etc.), concentrations, and preperation conditions was possible. It turns out that the degree of debundeling can be tuned using an intermittent ultrasonication, varying the waiting times for the dispersion constituents to settle down between recurrent sonotrode pulses. The influence of temperature during centrifugation and storage of the dispersion is discussed as well.