Dresden 2017 – scientific programme

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MI: Fachverband Mikrosonden

MI 6: Symposium Nanostructuring Beyond Conventional Lithography
(MI with DS, DF, HL, MM and VA)

Wednesday, March 22, 2017, 15:00–17:45, HSZ 02

	15:00	MI 6.1	Invited Talk: The Limits to Lithography: How Electron-Beams Interact with Materials at the Smallest Length Scales — •Karl K. Berggren
	15:30	MI 6.2	Invited Talk: High precision fabrication for light management at nanoscale — •Saulius Juodkazis and Armandas Balcytis
	16:00	MI 6.3	Invited Talk: Directed self-assembly of performance materials — •Paul Nealey
	16:30		15 min. break
	16:45	MI 6.4	Invited Talk: Nanometer accurate topography patterning using thermal Scanning Probe Lithography — •Armin W. Knoll
	17:15	MI 6.5	Invited Talk: High resolution 3D nanoimprint lithography — •Hartmut Hillmer