Dresden 2017 –
wissenschaftliches Programm
O 50: Semiconductor Substrates: Structure, Epitaxy, Growth and Adsorption
Dienstag, 21. März 2017, 18:30–20:30, P1A
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18:30 |
O 50.1 |
Mask aligner for shadow mask evaporation of nanostructures — •Simon Mathioudakis, Priyamvada Bhaskar, Tim Olschewski, Marcus Liebmann, Marco Pratzer, and Markus Morgenstern
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18:30 |
O 50.2 |
Hydrogen etching of SiC(0001): Route to an epitaxy template — •Maximilian Bauernfeind, Felix Reis, Victor Rogalev, Marius Will, Ralph Claessen, and Jörg Schäfer
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18:30 |
O 50.3 |
Halbleiterheterostrukturen - Analyse und Interpretation kapazitätsspektrokopischer Messungen — •Martin von Sprekelsen und Wolfgang Hansen
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18:30 |
O 50.4 |
Reaction channels of methanol on Si(001) studied by means of STM and XPS — •Patrick Kirsten, Christian Länger, and Michael Dürr
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18:30 |
O 50.5 |
HREELS of Ammonia Adsorbed on a Water Reacted Si(001)-(2x1) Surface — •Niklas Fornefeld, Felicitas Scholz, Ulrich Köhler, Stefan Kubsky, and Francois Rochet
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18:30 |
O 50.6 |
As-modification of vicinal Si(100) surfaces for III-V-on-Si heteroepitaxy in CVD ambient — •Agnieszka Paszuk, Oliver Supplie, Sebastian Brückner, Peter Kleinschmidt, Anja Dobrich, Andreas Nägelein, Matthias M. May, and Thomas Hannappel
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18:30 |
O 50.7 |
Adsorption of acetone on TiO2 rutile(110) — •Jessica Kräuter, Milena Osmić, and Katharina Al-Shamery
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