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Dresden 2017 – scientific programme

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O: Fachverband Oberflächenphysik

O 50: Semiconductor Substrates: Structure, Epitaxy, Growth and Adsorption

Tuesday, March 21, 2017, 18:30–20:30, P1A

18:30 O 50.1 Mask aligner for shadow mask evaporation of nanostructures — •Simon Mathioudakis, Priyamvada Bhaskar, Tim Olschewski, Marcus Liebmann, Marco Pratzer, and Markus Morgenstern
18:30 O 50.2 Hydrogen etching of SiC(0001): Route to an epitaxy template — •Maximilian Bauernfeind, Felix Reis, Victor Rogalev, Marius Will, Ralph Claessen, and Jörg Schäfer
18:30 O 50.3 Halbleiterheterostrukturen - Analyse und Interpretation kapazitätsspektrokopischer Messungen — •Martin von Sprekelsen und Wolfgang Hansen
18:30 O 50.4 Reaction channels of methanol on Si(001) studied by means of STM and XPS — •Patrick Kirsten, Christian Länger, and Michael Dürr
18:30 O 50.5 HREELS of Ammonia Adsorbed on a Water Reacted Si(001)-(2x1) Surface — •Niklas Fornefeld, Felicitas Scholz, Ulrich Köhler, Stefan Kubsky, and Francois Rochet
18:30 O 50.6 As-modification of vicinal Si(100) surfaces for III-V-on-Si heteroepitaxy in CVD ambient — •Agnieszka Paszuk, Oliver Supplie, Sebastian Brückner, Peter Kleinschmidt, Anja Dobrich, Andreas Nägelein, Matthias M. May, and Thomas Hannappel
18:30 O 50.7 Adsorption of acetone on TiO2 rutile(110) — •Jessica Kräuter, Milena Osmić, and Katharina Al-Shamery
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