Regensburg 2000 – wissenschaftliches Programm

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HL: Halbleiterphysik

HL 10: Diamant

HL 10.10: Vortrag

Montag, 27. März 2000, 18:45–19:00, H13

The influence of various physical parameters on the removal rate of thermochemically polished CVD diamond films — •James A. Weima, Reinhart Job, Frank Blum, and Wolfgang R. Fahrner — FernUniversitaet Hagen, FB Elektrotechnik, LGBE, Haldener Str. 182, 58084 Hagen

We investigated the parameters controlling the removal rate of CVD diamond films that were thermochemically polished on transition metals in a mixed argon-hydrogen atmosphere. The parameters selected for the experiments were the ambient temperature, the pressure exerted on the diamond film, the angular velocity of the polishing plate, the frequency and the amplitude of the applied transversal vibrations. when a specific parameter was investigated, all other parameters were kept constant. Temperature measurements done in the range 1023 to 1323 K revealed an exponential increase of the removal rate with increasing temperature. An exponential increase of the removal rate was also observed with increasing pressure. However, an exponential decrease in the removal rate was observed with increasing angular velocity of the polishing plate. The removal rate was found to be of a factor 3 higher when the polishing plate was subjected to transversal vibrations. By increasing the amplitude of the transversal vibrations, an exponential increase in the removal rate was observed. Raman measurements revealed non-diamond Raman lines for films polished at 1273 K and 1323 K.