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P: Plasmaphysik
P 12: Plasma Wall Interaction, Diagnostic and Low Temperature Discharges (Poster Session)
P 12.24: Poster
Freitag, 6. April 2001, 12:30–15:00, AT2
Liquid water jet laser plasma source for Extreme Ultraviolet Lithography — •Ulrich Vogt1, Holger Stiel1, Ingo Will1, Peter V. Nickles1, Wolfgang Sandner1, Marek Wieland2, and Thomas Wilhein2 — 1Max-Born-Institut, Max-Born-Strasse 2a, D-12489 Berlin — 2RheinAhrCampus Remagen, Südallee 2, D-53424 Remagen
Laser produced plasmas using thin liquid jets as target systems are attractive low-debris and high-brightness sources in the soft X-ray range. For application of these sources in extreme ultraviolet lithography (EUVL) both high stability and high average power operation of the driver laser are required. We report on a water liquid jet laser plasma source for EUVL at 13nm. This target system is in principle suitable for continuous high repetition rate operation. However, the hydrodynamical behaviour of the liquid jet target under illumination with high average power (in the kW regime) is still unknown. Another important question is the maximum achievable conversion efficiency of laser light into EUV-light, which should depend on the laser pulse duration.
In order to study and optimize the target system we used the MBI burst laser as a model for a high average power laser. A calibrated soft x-ray slit grating spectrograph allowed us to get absolute photon numbers and to calculate conversion efficiencies. To find the optimum operation point for the liquid water jet target as well as suitable parameters for the driver laser we investigated the stability of the target as a function of laser repetition rate and the conversion efficiency as a function of pulse duration.