Hamburg 2001 – wissenschaftliches Programm
Bereiche | Tage | Auswahl | Suche | Downloads | Hilfe
SYOF: Organische Festkörper
SYOF 5: Poster Session
SYOF 5.43: Poster
Dienstag, 27. März 2001, 17:00–19:00, Aula S3
Wetting Behaviour of PEDOT on Photo Resist Structures — •Jan Birnstock1, Joerg Blaessing1, Arvid Hunze1, Marcus Scheffel1, Karsten Heuser1, Matthias Stoessel1, Georg Wittmann1, and Albrecht Winnacker2 — 1Siemens AG, ZT MF 1, Paul-Gossen-Str. 100, 91052 Erlangen — 2Universitaet Erlangen-Nuernberg, Institut fuer Werkstoffwissenschaften, Martensstr. 7, 91058 Erlangen
LCDs that are widely used in mobile phones and car radios offer a number of disadvantages (readability, prize). Therefore the launch of passive matrix displays on the basis of functional polymers like PPV or Polyfluorenes is pushed very hard. One of the key issues in the production of these displays is to cover the ITO-on-glass substrate - on which are also situated photo resist structures - with the first organic polymer layer, e.g. PEDOT that levels the unevenness of the ITO. The classical technique to spread the PEDOT is spin coating because it allows to produce thin homogeneous films of a certain thickness. But the functional photo resist structures complicate the uniform wetting of the substrate. We investigate the wetting behaviour of PEDOT on several photo resist structures. Due to the use of different photo resists, the add-on of a wetting agent to the PEDOT, and the surface modification with reactive ion etching we improved the wetting of the PEDOT. We show SEM- and AFM-images to illustrate the progress. Performance data of organic light emitting diodes are provided to verify the effects of the particular modification steps on the device performance.