Regensburg 2002 – wissenschaftliches Programm
SYPF 2.13: Poster
Donnerstag, 14. März 2002, 09:00–18:00, Poster B
Nanotemplates and nanoporous membranes from block copolymers — •Igor Tokarev, Alexander Sidorenko, Sergiy Minko, and Manfred Stamm — Institut fuer Polymerforschung e.V., Hohe Strasse 6, 01069 Dresden
Recently developed lithographic technique based on block copolymer nanotemplates is free from the main limitation of electron beam and X-ray lithography caused by large time required to produce a single pattern. Polymer nanotemplates are promising for the fabrication of regular nanostructures such as arrays of nanowires and nanodots. Some possible applications of polymer nanotemplates require the perpendicular to the plane of substrate orientation of cylinders or lamella, while the substrate induced parallel alignment of microdomains. In addition the component forming nanoscopic domains should be easily and selectively removed to fabricate voids an channels. In our work we use phase segregation in diblock-copolymer film with a stoihiometric complex of one of the block with low-molecular weight surfactant to produce regular arrays of cylindrical domains. The surfactant molecules are easily washed out in a selective solvent resulting in formation of cylindrical channels. Step-by step plasma etching and AFM were employed to characterize the film morphology. The regular patterns or arrays of oriented nanochannels with a period of 10-50 nm and density of the structures of 4xE10 - 1xE12 per sq. cm were fabricated using this approach.