Regensburg 2002 – wissenschaftliches Programm
SYPF 2.38: Poster
Donnerstag, 14. März 2002, 09:00–18:00, Poster B
Stiffness and adhesion characterization of nanolithographed poly(methyl methacrylate) by means of force-displacement curves. — •Brunero Cappella and Heinz Sturm — Bundesanstalt fuer Materialforschung und -pruefung - 12205 Unter den Eichen Berlin
Polymethylmethacrylate surfaces have been modified by means of Dynamic Plowing Lithography. The resulting modified structures, presenting regions of different density and stiffness, have been studied taking advantage of force-displacement curves. The elasto-plastic response, the stiffness, and the adhesion of the modified samples have been characterised. Force-displacement curves are able to distinguish between not modified polymethyl-methacrylate and two different structures resulting from the lithography, namely compressed polymethylmethacrylate and low density polymethylmethacrylate. In particular, the low density regions are made up of cluster-like globular particles, whose elasto-plastic and adhesive response can be analysed and whose contribution to the total elasto-plastic response and to the adhesion has been studied in detail.