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Regensburg 2004 – scientific programme

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O: Oberflächenphysik

O 24: Nanostrukturen II

O 24.4: Talk

Tuesday, March 9, 2004, 16:30–16:45, H38

Behavior of quantum-well and surface states of Ag/Ni(111) — •A. Varykhalov1, O. Rader1, C. Di Giacomo1, A. M. Shikin1,2, W. Gudat1,3, C. Grazioli4, and C. Carbone41BESSY, 12489 Berlin — 2Institute of Physics, St. Petersburg State University, 198504 Russia — 3Insitut für Physik, Universität Potsdam, 14415 Potsdam — 4CNR-ISM, I-34012 Trieste

Ag films on Ni(111) are known to lead to quantum-well states in angle-resolved photoemission experiments [1]. We have improved the growth of Ag/Ni(111) by low-temperature deposition and post-annealing. The dispersion of quantum well states parallel to the film plane has been measured, and the influence of the substrate on the dispersion is compared for low (∼5 atomic layers) and high thickness (∼20 layers). Moreover, a decrease of the intensity of the L-gap centered surface state of Ag(111) with increasing Ag coverage is observed. The results are discussed in connection to our recent data obtained from Ag films on W(110) and Ge(111).

[1] T. Miller, A. Samsavar, and T.-C. Chiang, Phys. Rev. B 50, 17686 (1994).

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