Berlin 2005 – wissenschaftliches Programm

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DF: Dielektrische Festkörper

DF 4: Poster

DF 4.12: Poster

Samstag, 5. März 2005, 08:30–16:30, Poster TU C

Ionic Motion in Ion Beam Sputtered Thin Film Glasses — •Frank Berkemeier and Guido Schmitz — Institut für Materialphysik, Wilhelm–Klemm–Str. 10, 48149 Münster, Westfählische–Wilhelms–Universität Münster

Ion-conducting, amorphous thin films of a thickness between 50 nm and 1 µm are prepared using the ion beam sputter technique. A sodium borate glass of the composition 0.20 Na₂O · 0.80 B₂O₃ serves as the target. The glass layers are deposited on a silicon substrate between two sputtered silver electrodes. Temperature-dependent electrical measurements on the glass films performed by impedance-spectroscopy and direct-current technique reveal a specific dc-conductivity of the films independent of their thickness but about one order of magnitude higher than the dc-conductivity of the target material. The activation enthalpies of the dc-conductivity are found to be about 20 kJ mol⁻¹ less compared to that of the bulk material. Cross-section investigations obtained by TEM give inside in the surface reactions between the solid electrolyte and the silver electrode after the flow of an ionic current caused by impedance-spectroscopy or dc-measurements, respectively.