Berlin 2005 – wissenschaftliches Programm

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DS: Dünne Schichten

DS 13: Ionenstrahlverfahren II

DS 13.3: Vortrag

Montag, 7. März 2005, 14:45–15:00, TU HS107

Smoothening, mixing and sputtering of semimetal- and halogenide-coatings by swift heavy ion irradiation — •Hartmut Paulus, Wolfgang Bolse, and Bouschaib Bahouchi — Institut für Strahlenphysik, Stuttgart

Thin layers of Bismuth and several Halogenides have been deposited onto Silicon and Silicon Oxide substrates by thermal evaporation at different substrate temperatures. The samples were irradiated with different swift heavy ions (SHI) of various energies and fluences at a temperature of about 80K. After irradiation the irradiated as well as the remaining non-irradiated parts of the samples were characterized by surface profilometry (SP) and Rutherford backscattering spectrometry (RBS). From the RBS data the thickness of the coating can be determined. The combination of SP and RBS allows to distinguish between surface roughness and interface mixing. It is well-known that depending on the deposition conditions these materials exhibit a more or less rough surface, which in fact was also observed in our case. The irradiation with SHI results in 3 different effects. At low fluences smoothening, which is probably due to compaction of the material (reduction of the interface variances in the RBS spectra), occurs. Higher fluences on the other hand lead to significant intermixing of the coating with its substrate (increase of the interface variances in the RBS spectra). At very high fluences also sputtering can be observed. These effects will be discussed in terms of transport of matter in ion tracks.