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Berlin 2005 – scientific programme

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DS: Dünne Schichten

DS 23: Postersitzung I

DS 23.19: Poster

Friday, March 4, 2005, 16:00–18:30, Poster TU B

A new simple but rapid method to form aligned nanochannels — •Sebastian Wille, Michael Scharnberg, and Rainer Adelung — Lehrstuhl für Materialverbunde, Technische Fakultät CAU Kiel, Kaiserstr. 2, 24143 Kiel

To produce channels on the submicron- or nanometer scale is of interest for several technical applications like hydrophobic/hydrophilic interfaces for biotechnology or parallel electrical contacts for nanosized objects. Recently [1], we showed how well organized nanowires can be formed by using cracks made by thin film fractures as template. By producing the same aligned cracks in a thin film which has a low ion sputter rate, instead of deposition, we can remove material through the cracks. Nano-channels were fabricated, e.g. by the deposition of a carbon thin film on a gold coated Si or SiO2 sample. Subsequent crack formation in the carbon layer by rapid cooling in liquid nitrogen and sputter etching to assign the cracks in the carbon layer to the subjacent Au-layer leads to the formation of insulating channels on the nanometer scale. In addition to electrical and nanoscopic characterisations we discuss the possible applications.

[1] Adelung et al., Nature Materials, Vol.3, 375 (2004)

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