Berlin 2005 – wissenschaftliches Programm

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DS: Dünne Schichten

DS 6: Anwendung dünner Schichten

DS 6.3: Vortrag

Freitag, 4. März 2005, 15:00–15:15, TU HS110

Ordered arrays of semiconductor nanoparticles using thin films of block copolymers as templates — •Dong Ha Kim, Xue Li, and Wolfgang Knoll — Max Planck Institute for Polymer Research, 55128 Mainz

In this presentation latest developments concerning the use of self-assembled block copolymers for nanofabrication are discussed. Simple routes to fabricate patterned inorganic semiconductor nanostructures are presented using block copolymer thin films as templates. Asymmetric block copolymers provide a novel route by which ordered arrays of nanocylinders aligned normal to the film surface are produced by one-step spin coating from solution. Here micellar monolayer films of poly(styrene-co-2-vinyl pyridine) block copolymer (PS-b-P2VP) and thin films of poly(styrene-co-ethylene oxide) block copolymer (PS-b-PEO) were employed as scaffolds to incorporate inorganic materials within the polar PVP and hydrophilic PEO domains. Highly dense arrays of hexagonally-packed silica, titania, and composite titania/gold dot arrays were fabricated by chemical vapor deposition (CVD) methodology. The lateral spacing, i.e. the center-to-center distance between the dots and the size of the dots, were fine tuned by controlling the molecular weight of the block copolymers and ralative amounts of inorganic precursors to the block copolymers. Such site-specific semiconductor dot arrays patterned on a nanometer scale can have widespread uses for sensory and optoelectronic applications.