Berlin 2005 – wissenschaftliches Programm

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O: Oberflächenphysik

O 15: Postersitzung (Adsorption an Oberfl
ächen, Epitaxie und Wachstum, Organische Dünnschichten, Oxide und Isolatoren, Rastersondentechniken, Zeitaufgelöste Spektroskopie, Methoden)

O 15.50: Poster

Freitag, 4. März 2005, 17:00–20:00, Poster TU D

Thick Titanium Oxide Films by Unfiltered Arc Deposition — •Peter Drechsler and Roger Thull — Abteilung für Funktionswerkstoffe der Medizin und Zahnheilkunde, Universitätsklinikum Würzburg, Pleicherwall 2, 97070 Würzburg

Thick titanium oxide (Rutile) films have actractive properties like good blood compatibility and good corrosion resistance which are very suitable for medical implants. A sufficient thickness supplies the essential wear resistance.

The presented titanium oxide films are deposited by means of unfiltered arc sputtering technique on polycrystalline titanium and steel surfaces. The film thickness is 3–6 microns depending on the deposition time with a deposition rate of 4 microns/hour. The substrate temperature was varied from room temperature to 870 K. The ratio of the anatase to rutile phases depends on the subrate temperature as xrd measurements revealed. Above 670 K no anatase phase could be found. The polycrystalline rutile films grew predominately in (110)-direction.

The optical band gap of the rutile films was measured by means of uv-vis spectroscopy. The band gap was found at 3.00 ± 0.02 eV with low variation with the film thickness.