Berlin 2005 – wissenschaftliches Programm
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P: Plasmaphysik
P 2: Niedertemperaturplasmen / Plasmatechnologie 1
P 2.1: Fachvortrag
Freitag, 4. März 2005, 11:00–11:30, HU 3038
UHP Lamps for Projection Systems — •Pavel Pekarski, Ulrich Hechtfischer, Holger Moench, and Ulrich Weichmann — Philips Research Laboratories, Weisshausstr.2, D-52066 Aachen, Germany
UHP (Ultra High Performance) lamp is a key component for projection systems that allows to achieve highest efficiency for small display sizes. This broadband light source with luminance well above the brightness of the sun (1Gcd) and lifetimes of over 10000 hours is the standard for most commercially available front and rear projectors. Essential features of UHP are mercury pressure above 200 bar (needed for a good spectrum and high burning voltage at small electrode distances) and the implementation of a chemical cycle which keeps the wall clear over thousands of hours of lamp operation. In addition, the UHP electrodes have to deal with current densities of 10kAcm−2 and heat loads of 100kWcm−2. It is a major task of UHP electrode design to handle this heat load and realize an electrode temperature low enough to reduce electrode burn-back to a minimum so that the required short arc length is maintained. This talk will span the bridge from projection application requirements to actual plasma lamp research.