Parts | Days | Selection | Search | Downloads | Help

CPP: Chemische Physik und Polymerphysik

CPP 27: POSTER Polymer Physics and Materials

CPP 27.31: Poster

Thursday, March 30, 2006, 17:00–19:00, P2

Fabrication and electrical characterization of Polypyrrole nanowires — •Jörn-Holger Franke, Bin Dong, Lifeng Chi, and Harald Fuchs — Physikalisches Institut and CENTech, Wilhelm-Klemm Str. 10, WWU Münster

E-Beam Lithography is used to pattern a resist structure (PMMA-Resist on Silicon-Wafer) which is subsequently used as a mask for copolymerization of Pyrrole and N-(3-Trimethoxysilyl-Propyl) Pyrrole. The Trimethoxysilyl group of the latter one binds covalently to the Silicon Dioxide of the Wafer, thereby enabling the generated Polypyrrole nanowires to survive the following Lift-Off Process. Gold electrodes are evaporated on top of the resulting Polypyrrole to form easily accessible electrodes for conductivity measurements. The dependence of specific conductivity on nanowire diameter is studied.