Dresden 2006 – wissenschaftliches Programm
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O: Oberflächenphysik
O 14: Poster session I (Adsorption, Epitaxy and growth, Phase transitions, Surface reactions, Organic films, Electronic structure, Methods) (sponsored by Omicron Nanotechnology GmbH)
O 14.10: Poster
Montag, 27. März 2006, 18:00–21:00, P2
Electrochemical deposition of Cu nanowires on TaS2 — •Yinxiang Bai1, Sujit kumar dora1, Olaf Magnussen1, Rainer Adelung2, and Mady Elbahri2 — 1Institut für Experimentelle und Angewandte Physik, Christian-Albrecht-Universität zu Kiel, Leibnizstr. 19, 24118 Kiel, Germany — 2Technische Fakultät der Christian-Albrechts-Universität zu Kiel, Kaiserstraße 2, 24118 Kiel, Germany
Metal deposition on transition metal dichalcogenides under vacuum conditions has been shown to result in the formation of metal nanowires for a number of systems [1]. Here we demonstrate that similar nanowires can also be formed by electrochemical deposition, using Cu electrodeposition on TaS2 as an example. Studies by cyclic voltammetry, ex-situ scanning electron microscopy, and in-situ scanning tunnelling microscopy reveal characteristic differences to Cu nanowires formed by vacuum deposition as well as details on the growth process.
[1] R. Adelung, R. Kunz, F. Ernst, L. Kipp, and M. Skibowski, in: Adv. in Solid State Physics 43, B. Kramer (Ed.), Springer, Heidelberg, 2003, p. 463-476