Dresden 2006 – wissenschaftliches Programm
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O: Oberflächenphysik
O 14: Poster session I (Adsorption, Epitaxy and growth, Phase transitions, Surface reactions, Organic films, Electronic structure, Methods) (sponsored by Omicron Nanotechnology GmbH)
O 14.59: Poster
Montag, 27. März 2006, 18:00–21:00, P2
Growth and electronic structure of thin NiO(111) films — •Alexander Gottberg1, Eugen Weschke1, Alexander Helmke1, Enrico Schierle1, Krishnakumar S. R. Menon2, and Günter Kaindl1 — 1Institut für Experimentalphysik, Freie Universität Berlin, Arnimallee 14, 14195 Berlin, Germany — 2Surface Physics Division, Saha Institute of Nuclear Physics, 1/AF, BidhanNagar, Kolkata 700 064, India
The polar (111) surfaces of the rocksalt structure are matter of experimental and theoretical interest. They are difficult to prepare and exhibit surface reconstructions. For these reasons, little is known experimentally about the NiO(111) surface, in particular about its electronic structure. We have prepared NiO(111) thin films by Ni evaporation in oxygen atmosphere on Ag(111) thin-film substrates grown on W(110). The growth and structural properties were studied by hard x-ray scattering in situ, indicating layer-by-layer growth up to a film thickness of about 8 layers. Hexagonal LEED patterns show a (1x1) surface structure. The valence electronic structure of the NiO(111) films was studied by angle-resolved photoemission with synchrotron radiation, revealing pronounced dispersion of d-derived states. Surprisingly, we find high density of states at the Fermi energy for the present films, in spite of the fact that NiO is known to be an insulator.