Dresden 2006 – wissenschaftliches Programm
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O: Oberflächenphysik
O 20: Epitaxy and growth II
O 20.1: Vortrag
Dienstag, 28. März 2006, 11:15–11:30, WIL B321
In-situ diffraction studies of homoepitaxial electrochemical growth on Au(100) — •Klaus Krug, Jochim Stettner, and Olaf M. Magnussen — Institut für Experimentelle und Angewandte Physik, Christian-Albrechts-Universität, 24098 Kiel
The surface structure and growth behaviour of Au(100) electrodes during electrodeposition in HAuCl4-containing HCl solution has been studied in-situ by high-energy surface x-ray diffraction in transmission geometry. Using a ”hanging meniscus” cell structural data can be obtained parallel to electrochemical measurements. To distinguish the effects of the interface structure on the deposition process from effects caused by different deposition rates, measurements were performed under diffusion limited deposition conditions. By time-dependent measurements of the x-ray intensity at selected positions along specular and non-specular crystal truncation rods a complex potential-dependent growth behavior was found: With decreasing potential transitions from step-flow deposition to layer-by-layer growth, manifested by layering oscillations in the x-ray intensity, then to 3D growth, and finally back to layer-by-layer growth were observed. The latter occurred parallel to the formation of the ”hex” reconstruction on the Au(100) surface. This growth behavior can be explained by the effect of Cl adsorbates and the Au surface structure on the mobility of Au adatoms.