Regensburg 2007 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 24: Ion Beam Techniques
DS 24.7: Vortrag
Donnerstag, 29. März 2007, 12:45–13:00, H34
Nanoporous carbon thin films manufactured by ion beam treatment of self-assembled block-copolymer nanotemplates — •Valeriy Luchnikov1, Manfred Stamm1, Alexey Konduyrin2, and Marcela Bilek2 — 1Leibniz-Institut of Polymer Research Dresden, Hohe Str. 6, 01069 Dresden, Germany — 2School of Physics, University of Sydney, New South Wales 2006, Australia
Well-defined nanoporous carbon materials are explored for a number of advanced applications such as separation media, energy storage/conversion systems, catalyst supports, nano-electronic devices. Self-assembled block-copolymer thin films constitute a promising precursor material to formation of highly-ordered nanoporous carbon thin films via carbonization reactions. One of the carbonization techniques is ion beam implantation that transforms a polymer to insoluble electrically conductive carbonized structure, which can operate under aggressive media, high energy irradiations, mechanical load and high temperature. We have shown that a nanoporous BC-film can be completely carbonized by high-energy ion beam implantation, while preserving highly-ordered morphology. Thickness and structure of the carbonized nano-template are analyzed. Ion-beam induced carbonization does not require high tempratures and permits delicate modification of only the top 100 - 200 nm thick layer. This opens up new possibilities, such as formation of ordered carbon thin films on plastic and fusible metal substrates for flexible electronics. The method is also perspective for manufacture of free-standing nanoporous carbon membranes for different applications.