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MA: Fachverband Magnetismus

MA 20: Magnetic Thin Films II

MA 20.5: Talk

Wednesday, March 28, 2007, 16:15–16:30, H5

Ripple Induced Modifications of Magnetic Properties. — Maciej Oskar Liedke, Adrian Keller, Stefan Facsko, and •Jürgen Fassbender — Forschungszentrum Dresden-Rossendorf, Institute of Ion Beam Physics and Materials Research, D-01314 Dresden

Self-organized ripple formation during ion erosion of a Si wafer is used to create a template system with a well defined roughness of uniaxial symmetry. By using special buffer layers subsequent thin magnetic film deposition by molecular beam epitaxy leads to a periodically modulated magnetic thin film with drastically modified magnetic properties with respect to a nominally flat film of the same thickness. In the case of Permalloy thin films, an enhancement of the uniaxial in-plane anisotropy by approximately a factor of 20 is observed. The enhancement can be explained by a combination of step induced dipolar and magnetocrystalline surface anisotropy contributions. If a ferromagnet/antiferromagnet-bilayer is deposited a superposition of ripple-induced uniaxial anisotropy and exchange coupling induced unidirectional anisotropy is observed. Since the direction of the unidirectional anisotropy depends only on the magnetic field direction during a field cooling procedure any angle between both anisotropy contributions can be set.