Regensburg 2007 – scientific programme

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O: Fachverband Oberflächenphysik

O 14: Metal Substrates: Epitaxy and Growth

O 14.1: Talk

Monday, March 26, 2007, 14:15–14:30, H39

Determination of the <110> and <100> step edge Ehrlich Schwoebel barriers on Cu(001) — •Frank Everts, Frits Rabbering, Herbert Wormeester, and Bene Poelsema — Solid State Physics, MESA+ Institute for Nanotechnology, University of Twente, Enschede, The Netherlands

Paths available for interlayer mass transport determine the morphology evolution in multilayer growth. On Cu(001) the paths over the closed packed and open step edge compete. Their availability for interlayer diffusion is expressed by the so-called Ehrlich-Schwoebel barrier. Their height determines the layer distribution already in the early stages of growth as measured from the specular reflection of a thermal energy He atom beam. The value of the barriers for the two pathways is obtained from comparing the experimental roughness evolution with a Monte Carlo simulation incorporating both intra- and interlayer diffusions. A triangulation of experimental and simulated results at different temperatures and coverage enables an accurate determination of the two very different Ehrlich Schwoebel barriers.