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DPG

Regensburg 2007 – scientific programme

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O: Fachverband Oberflächenphysik

O 44: Poster Session II (Semiconductors; Oxides and Insulators: Adsorption, Clean Surfaces, Epitaxy and Growth; Surface Chemical Reactions and Heterogeneous Catalysis; Surface or Interface Magnetism; Solid-Liquid Interfaces; Organic, Polymeric, Biomolecular Films; Particles and Clusters; Methods: Atomic and Electronic Structure; Time-resolved Spectroscopies)

O 44.15: Poster

Wednesday, March 28, 2007, 17:00–19:30, Poster C

Site selective growth of organic moleculesWenchong wang1, dingyong zhong1, jia zhu1, felix Kalischewski2, •chuan du1, andreas heuer2, harald fuchs1, and lifeng chi11Physikalisches Institut and Center for Nanotechnology (CeNTech), Universität Münster, 48149 Münster, Germany — 2Institut für Physikalische Chemie, Universität Münster, 48149 Münster, Germany

Devices with active organic layers are of great interest recently due to their less energy consumable process and potential low cost. However, the future success of these interesting materials in applications will strongly depend on fabrication processes that include patterning. We present a general method to pattern organic molecules by template-directed nucleation control using organic molecular beam deposition. Fully sites selective growth of organic molecules can be controlled at optimized conditions. We use simple Lennard-Jones (LJ) pair potentials to mimic the molecular interactions. The simulation results have good agreements with experimental data. This technique can be applied to fabricate large area uniform organic devices.

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