Regensburg 2007 – wissenschaftliches Programm

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SYOE: Symposium Organic Thin Film Electronics: From Molecular Contacts to Devices

SYOE 8: Poster Session SYOE

SYOE 8.50: Poster

Dienstag, 27. März 2007, 18:00–20:00, Poster B

Systematic studies on the morphology of OVPD processed films upon substrate temperature and deposition rate — •Azadeh Farahzadi¹, Phenwisa Niyamakom¹, Maryam Beigmohamadi¹, Chritian Effertz¹, Nico Meyer², Dietmar Keiper², Michael Heuken^2,4, Holger Schwab³, Mohammad Reza Rahimi Tabar^5,6, Thomas Michely¹, and Matthias Wuttig¹ — ¹Institute of Physics (IA), RWTH Aachen University of Technology, 52056 Aachen, Germany — ²AIXTRON AG, Kackertstr. 15-17, 52072 Aachen, Germany — ³Philips Technologie GmbH, Philipsstr. 8, 52066 Aachen, Germany — ⁴Institute of Electromagnetic Theory, RWTH Aachen University of Technology, Kopernikusstr. 16, 52074 Aachen, Germany — ⁵CNRS UMR 6529, Observatoire de la Côte d'Azur, BP 4229, 06304 Nice Cedex 4, France — ⁶Department of physics, Sharif University of Technology, 11365-9161 Tehran, Iran

In order to tailor and modify thin film properties to be suitable for organic light emitting devices (OLED) it is necessary to study and understand the influence of deposition parameters on thin film growth. The chosen material is α-NPD processed by organic vapor-phase deposition (OVPD). Film growth in OVPD is controlled by three independent parameters which are deposition rate, substrate temperature and chamber pressure. Our study is focused on the influence of deposition rate and substrate temperature on the film morphology. A remarkable dependence of the film morphology upon deposition parameters has been observed. A detailed quantitative morphology analysis provides excellent description of the growth mechanism of OLED films.