Dresden 2009 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 16: Poster I

DS 16.22: Poster

Dienstag, 24. März 2009, 09:30–12:30, P5

Self-assembled Silane monolayers on silicon oxide — •Harald Graaf, Christian Belgardt, David Polster, and Christian von Borczyskowski — Center of Nanostructured Materials and Analytics, University of Technology Chemnitz, 09107 Chemnitz, Germany

Chemical modification of silicon oxide surfaces by various Silane molecules is a well known method. As a standard Silane the octadecyl-trichloro-silane (OTS) is used to prepare highly ordered monolayers with a pure hydrophobic character. For example, it is also used in organic electronics to minimize trap states on the surface of the gate isolator to improve the output characteristics as well as the long time stability in organic field effect transistors.

Here we will report the influence of silicon oxide of different thickness and the reaction time on the formed monolayer of OTS. The characterization of the self-assembled monolayer was done by static contact angle measurements. By using different liquids the surface energies of the samples with its polar and dispersive components were determined.

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