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Dresden 2009 – scientific programme

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MA: Fachverband Magnetismus

MA 17: Magnetic Thin Films I

MA 17.3: Talk

Wednesday, March 25, 2009, 10:45–11:00, HSZ 04

Tailoring the FePt orientation on amorphous substrates by magnetron sputtering - Structural and magnetic investigations — •valentina cantelli, johannes von borany, jörg grenzer, and jürgen fassbender — Institute of Ion Beam Physics and Materials Research, Forschungszentrum Dresden-Rossendorf, Dresden, Germany

High magnetocrystalline (001) oriented L10 FePt layers are widely studied for perpendicular recording magnetic media. We will report about the tuning of FePt (001) orientation using Ar and Xe gases, onto a-SiO2/Si substrates by magnetron sputtering deposition at 0.3 Pa. Layer-by-layer and co-deposition were investigated comparatively. Thin (∼12 nm) Fe55Pt45 layers were deposited at RT, subsequently annealed at 750C to induce the A1-L10 ordering transformation. Sputtering in Ar delivers energetic particles (∼ 12 eV sputtered Fe or Pt atoms and ∼ 100 eV Ar reflected neutrals from Pt target). This energy budget enhances surface adatom mobility, creates vacancies [1], and supports vertical intermixing into the layer, during deposition. At RT, a randomly oriented crystalline FePt A1 structure is produced. After annealing, the L10 phase is obtained with coercive field HC = 20 kOe and weak (001) orientation, irrespective of deposition methods. Sputtering in Xe significantly reduces energetic impacts from backscattered neutrals. Using a layer-by-layer deposition, L10 films have HC = 5.6 kOe with the lowest (∼ 2.5) angular dispersion around the (001) direction. [1] V. Cantelli, J. von Borany, A. Mucklich, Shengqiang Zhou, J. Grenzer, Nucl. Instr. and Meth. B 257, (2007) 406

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