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Dresden 2011 – scientific programme

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DS: Fachverband Dünne Schichten

DS 34: Progress in Micro- and Nanopatterning: Techniques and Applications III (Focused Session, jointly with O -- Organisers: Graaf, Hartmann)

Wednesday, March 16, 2011, 15:00–17:00, GER 38

15:00 DS 34.1 Femtosecond laser induced recrystallization and ablation of hydrogenated amorphous silicon films — •Babak Soleymanzadeh, Christian Strüber, Helmut Stiebig, and Walter Pfeiffer
15:15 DS 34.2 Photothermal Laser Micro- and Nanoprocessing of Mesoporous Gold — •Lina Schade, Mareike Mathieu, Monika Biener, Juergen Biener, and Nils Hartmann
15:30 DS 34.3 Photothermal laser patterning of buried polymer interfaces — •Anja Schröter, Steffen Franzka, and Nils Hartmann
15:45 DS 34.4 Photothermally induced chemical patterning of organic monolayers on oxide-free silicon substrates — •Martin Przyklenk, Benjamin Klingebiel, Luc Scheres, Han Zuilhof, and Nils Hartmann
16:00 DS 34.5 Pattern transfer on large samples using a sub-aperture reactive ion beam — •André Miessler, Agnes Mill, Jürgen W. Gerlach, and Thomas Arnold
16:15 DS 34.6 Swift Heavy Ion Beam Shaping Of Sub-Micron Structures — •R. Ferhati, N. Guilliard, T. Weishaar, S. Amirthapandian, M. Fritschke, L. Bischoff, and W. Bolse
16:30 DS 34.7 Surfactant driven self-organized surface patterns by ion beam erosion — •Hans Hofsäss and Kun Zhang
16:45 DS 34.8 Dynamics of surfactant induced ripple patterns on Si generated by ion beam erosion — •Kun Zhang, Hans Hofsäss, Hans-Gregor Gehrke, and Oliver Göpfert
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