Dresden 2011 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 69: Electronic structure I

O 69.7: Vortrag

Donnerstag, 17. März 2011, 12:45–13:00, WIL C107

A Non-destructive Technique of Investigating Bulk Electronic Properties and Buried Interfaces — •Mihaela Gorgoi, Franz Schäfers, and Alexander Föhlisch — Helmholtz-Zentrum Berlin für Materialien und Energie GmbH, BESSY II, Albert-Einstein-Str. 15, 12489 Berlin, Germany

In the past couple of years hard x-ray high kinetic energy photoelectron spectroscopy (HAXPES) has lead to a break-through in the field of photoemission due to its non destructive way of investigating the bulk electronic properties of materials and in particular buried interfaces. In the present contribution we will report recent experiments performed at the hard x-ray HIgh Kinetic Energy (HIKE) photoelectron spectroscopy facility [1] at the Berliner synchrotron light source BESSY II of the HZB. The facility successfully combines the bending magnet source of the KMC-1 beamline [2] with a new generation electron spectrometer optimized for high kinetic energy electrons. Several topics will be detailed such as the recoil effect of high energy photoelectrons from light elements and the interface electronic properties in organic and inorganic thin films and multilayers with emphasis on the performance and abilities of the technique. [1] M. Gorgoi, S. Svensson, F. Schäfers, G. Öhrwall, M. Mertin, P. Bressler, O. Karis, H. Siegbahn, A. Sandell, H. Rensmo, W. Doherty, C. Jung, W. Braun, W. Eberhardt, Nucl. Instrum. Methods Phys. Res. A 601 (2009) 48. [2] F. Schäfers, M. Mertin, M. Gorgoi, Rev. Sci. Instrum. 78 (2007) 123102.