Berlin 2012 – scientific programme
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HL: Fachverband Halbleiterphysik
HL 72: Poster Session: Si-based Photovoltaics / Inorganic Photovoltaics / Structure and Transport in Organic Photovoltaics / Organic Semiconductors
HL 72.14: Poster
Wednesday, March 28, 2012, 16:00–19:00, Poster D
Comparative characterisation of sputtered ZnO:Al TCO-layers on float glass produced by large ceramic and metallic — •Sebastian Wohner1, Hartmut Witte1, Martin Bähr2, Jörg Günther2, Jürgen Bläsing1, and Alois Krost1 — 1Institut für Experimentelle Physik, Otto-von-Guericke-Universität Magdeburg — 2Euroglas GmbH, Haldensleben
One of the main parts of photovoltaic cells is the conductive and trans-parent front contact which is often realized by wide bandgap ZnO. D.c. magnetron sputtering with ceramic ZnO :Al2O3 targets is one of the commonly used processes to produce ZnO-layers on float glass. Disadvantages are the fixed stoichiometric proportions and the high temperatures.
Alternatively, Al-doped ZnO-layers were deposited by reactive d.c. magnetron sputtering from a large, planar Zn(Al) under oxygen ambience. Hereby the operating point has to be within the unstable transition region of the power - oxygen pressure characteristic.
For comparison ZnO layers were produced by reactive and by ceramic magnetron d.c. sputtering using large targets. The ZnO layers were characterized and compared by resistivity, Hall-effect as well as by optical transmission- and reflection measurements to get the electron concentration using the Drude-model. The surface and the crystal structure were analysed by AFM and Bragg-Brentano X-ray diffraction, respectively. The results show the potential for the production of qualitatively good ZnO-layers as TCO by reactive d.c. magnetron sputtering on large cathodes using adapted process controlling.