Berlin 2012 – wissenschaftliches Programm
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MI: Fachverband Mikrosonden
MI 8: Poster – Microanalysis and microscopy
MI 8.2: Poster
Mittwoch, 28. März 2012, 15:00–17:30, Poster E
Alternative thin film and ion beam lithographic processing approaches for the fabrication of Fresnel zone plates — •Kahraman Keskinbora1, Corinne Grévent1, Markus Weigand1, Mato Knez2, Adriana Szeghalmi2, Nadzeyka Achim3, Lloyd Peto3, Anatoly Snigirev4, and Gisela Schütz1 — 1Max Planck Institute for Intelligent Systems, 70569 Stuttgart, Germany — 2Max Planck Institute for Microstructure Physics, 06120 Halle, Germany — 3Raith GmbH, 44263 Dortmund, Germany — 4European Synchrotron Radiation Facility (ESRF), 38043 Grenoble, France
Fresnel zone plates (FZPs) are diffractive optics which are widely used for focusing X-rays, especially in X-ray microscopes. Their resolutions are essentially determined by the width of their outermost zone. Electron beam lithography (EBL) is the usual method of fabrication; it delivers FZPs with very fine outermost zone widths. However, the technique requires several steps of fabrication and the achievable aspect ratio which is critical for an effective focusing of hard X-rays is limited. In this work, new alternative fabrication methods are reported. One alternative method is ion beam lithography (IBL). It advantageously allows the fabrication of FZPs in a single step. Another method involves the deposition of a multilayer on a glass fiber with atomic layer deposition followed by its sectioning to deliver a multilayer FZP (ML-FZP) without any limitation in aspect ratio. FZPs fabricated according to both methods have been successfully tested in a soft X-ray scanning microscope (STXM) to perform imaging.