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Berlin 2012 – scientific programme

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O: Fachverband Oberflächenphysik

O 10: [DS] Focused electron beam induced processing for the fabrication of nanostructures I (focused session, jointly with O – Organizers: Huth, Marbach)

Monday, March 26, 2012, 15:00–17:00, H 0111

15:00 O 10.1 Invited Talk: Focused electron beam lithography in the 1-10 nanometer range. — •Cornelis Wouter Hagen
15:30 O 10.2 Topical Talk: Fabrication of 1 nm thick Carbon Nanomembranes using FEBIP — •Armin Gölzhäuser
16:00 O 10.3 Topical Talk: Towards a microscopic understanding of the electron beam induced deposition of tungsten — •Harald Jeschke, Kaliappan Muthukumar, Ingo Opahle, Juan Shen, and Roser Valentí
16:30 O 10.4 Proximity Effects in Focused Electron Beam- Induced Processing on Ultra-thin MembranesMarie-Madeleine Walz, Florian Vollnhals, Florian Rietzler, Michael Schirmer, Hans-Peter Steinrück, and •Hubertus Marbach
16:45 O 10.5 Binary Pt-Si Nanostructures Prepared by Focused Electron-Beam-Induced Deposition — •Marcel Winhold, Christian Schwalb, Fabrizio Porrati, Roland Sachser, Achilleas S. Frangakis, Britta Kämpken, Andreas Terfort, Norbert Auner, and Michael Huth
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