Berlin 2012 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 26: Plasmonics and nanooptics II
O 26.8: Vortrag
Dienstag, 27. März 2012, 12:15–12:30, MA 005
Highly doped ZnO films with tailored plasma frequency grown by atomic-layer deposition for three-dimensional infrared metamaterials — •Andreas Frölich1,2,3 and Martin Wegener1,2,3 — 1Institut für Angewandte Physik, Karlsruhe Institute of Technology (KIT), 76128 Karlsruhe, Germany — 2DFG-Center for Functional Nanostructures (CFN), Karlsruhe Institute of Technology (KIT) — 3Institut für Nanotechnologie, Karlsruhe Institute of Technology (KIT)
We use atomic-layer deposition to grow ZnO films doped with Al (and Ti) at different concentrations and study their optical spectra. The measured spectra are well described by fits using a Drude free-electron model and the derived plasma frequencies are consistent with the expected amount of doping. The losses (damping) are also quantified.
We demonstrate that control of the doping concentration allows for continuously and controllably tunable plasma frequencies spanning almost an octave from 193 THz to 383 THz. In order to demonstrate the applicability of our approach for three-dimensional designs we have also deposited smooth, conformal coatings on three-dimensional polymer templates made by direct laser writing. Altogether, Al:ZnO appears as an attractive ``tunable metal'' for three-dimensional infrared metamaterials or transformation-optics architectures.