Dresden 2014 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 43: Poster II: Organic thin films; Atomic layer deposition, Thin film characterization: Structure analysis and composition (XRD, TEM, XPS, SIMS, RBS, ...)
DS 43.15: Poster
Donnerstag, 3. April 2014, 16:00–19:00, P1
Growth of Gold on P(VDF-TrFE) During RF-Sputter Deposition — •Alexander Hinz1, Oleksandr Polonskyi1, Thomas Strunskus1, Matthias Schwartzkopf2, Gonzalo Santoro2, Jan Perlich2, Ezzeldin Metwalli3, Yuan Yao3, Franz Faupel1, Stephan Roth2, and Peter Müller-Buschbaum3 — 1CAU zu Kiel, Technische Fakultät, LS Materialverbunde, Kaiserstr. 2, 24143 Kiel — 2Deutsches Elektronen-Synchrotron (DESY), Notkestr. 85, 22607 Hamburg, — 3TU München, Physik-Department, LS Funktionelle Materialien, James-Franck-Str. 1, 85748 Garching
Metallization of organic surfaces via sputtering is well established in industry and important for many applications. However, in contrast to metal evaporation, the basic mechanisms determining the final microstructure are not well understood due to the complex deposition process involving collisions with gas molecules and defect generation on the sensitive organic surface by energetic ions. The complex nature of the sputter process calls for in-situ measurements. Here we use in-situ grazing incidence small angle scattering (GISAXS) to obtain structural information with high spatial and temporal resolution. The growth of Au on P(VDF-TrFE) is chosen as a model system of inert metal and reactive polymer. The analysis of the GISAXS data yields morphological information about the different stages of the growing metal film. These results will be compared to results of a parallel GISAXS-study on the growth of Au on PS and already published results on the growth of Au on Si [1].
[1] Schwarzkopf et al., Nanoscale 5, 5053-5062 (2013)