Dresden 2014 – wissenschaftliches Programm

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MI: Fachverband Mikrosonden

MI 8: Poster: Microanalysis and Microscopy

MI 8.7: Poster

Mittwoch, 2. April 2014, 17:00–19:30, P4

Imaging applications and fabrication process of x-ray wave- guides — •Sarah Hoffmann, Henrike Neubauer, Mike Kanbach, Anna-Lena Robisch, and Tim Salditt — Institut für Röntgenphysik, Friedrich-Hund Platz 1, 37077 Göttingen

Nanoscale x-ray sources as provided by x-ray channel waveguides enable a multitude of novel applications such as diffraction, high resolution spectroscopy, microscopy and holography [1,2].We report on imaging experiments and the fabrication process of these hard x-ray waveguides deployed at the synchrotron source DESY, PETRA III/P10. Among other techniques e-beam lithography, reactive ion etching and Silicon wafer bonding are involved within the fabrication of two-dimensional, sub-100 nm sized waveguide channels. Both waveguide geometry and material can be adapted to meet the requirements of a specific experiment, such as the photon energy (7.9-17.5 keV), the desired source size, or the application of a reference beam in a holography setup. As the tunability of the optical properties provided by the waveguides, such as the coherence of the beam, its divergence or the waveguide transmission, depends sensitively on the precise control over the (several) process steps, an iterative process of diagnostics and optimization is essential.
A. Jarre et al., Phys. Rev. Lett. 94, 074801 (2005)
C. Krywka et al., J. Appl. Cryst. 45, 85-92 (2012)
A. Kohlstedt et al., Appl. Phys. A 91, 6-12 (2008)
H. Neubauer et al., in preparation