Berlin 2015 – wissenschaftliches Programm
Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe
DS: Fachverband Dünne Schichten
DS 37: Focussed Session: Oxide semiconductors II (joint session with HL)
DS 37.11: Vortrag
Donnerstag, 19. März 2015, 18:30–18:45, H 2032
Photocatalysis of Titania Thin Films Prepared by Sputtering versus Evaporation — Bodo Henkel1, Thomas Neubert2, Sebastian Zabel1, •Thomas Strunskus1, Michael Vergöhl2, and Franz Faupel1 — 1Lehrstuhl für Materialverbunde, Institut für Materialwissenschaft, Christian Albrechts Universität zu Kiel — 2Fraunhofer Institut für Oberflächen- und Schichttechnologie, Braunschweig
To achieve a deeper understanding about reasons for differing photocatalytic efficiencies of titania thin films made by different physical vapor deposition techniques, different grain and phase growth pathways of these titania thin films have been studied. Results are shown for two well established and widely used PVD methods, namely electron beam evaporation and reactive pulsed DC magnetron sputtering. In addition the effect of inducing oxygen vacancy defects by tempering in reducing atmospheres on their photocatalytic efficiency have been tested, as well as aging of these thin films. These titania thin films where characterized with respect to crystallinity, texture and phases (XRD and Raman), roughness and surface area (AFM), light transmission and band gap energy (UV-Vis), refractive index (Ellipsometry), film thickness (Profilometer, Ellipsometry, SEM cross section), grain growth and structure (AFM, SEM of surface and cross section) and photocatalytic efficiency (methylene blue degradation). Results show different nucleation and growth mechanisms for evaporated compared to sputtered titania thin films, which have severe influence on photocatalytic efficiency.