Berlin 2015 – wissenschaftliches Programm
Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe
DS: Fachverband Dünne Schichten
DS 8: Application of Thin Films
DS 8.1: Vortrag
Montag, 16. März 2015, 18:45–19:00, H 0111
Physics behind the growth of Multilayer Zone Plates — •Christian Eberl1, Florian Döring1, Markus Osterhoff2, Hans Hofsäss3, Tim Salditt2, and Hans-Ulrich Krebs1 — 1Institute for Materialphysics — 2Institute for X-ray physics — 3II. Institute of Physics, University of Göttingen, Germany
Due to the small wavelength and high penetration depth, X-ray microscopy is an auspicious technique for improved investigations of materials on nm-scale. For this, multilayer zone plates (MZP) with well-defined and smooth multilayers of low thickness grown on wires are promising focusing elements. We already have shown that high quality MZPs with sub-5nm focus size for hard x-rays can be fabricated using the combination of pulsed laser deposition (PLD) and focused ion beam (FIB) [1,2]. However, the growth of such multilayers onto wires with diameters of down to 500 nm is a challenging and ambitious project: During the multilayer growth occur stoichiometric changes, both element specific and angular dependent resputtering and backscattering as well as interfacial interactions. In order to control these effects, a deep understanding of the underlying processes is essential [2]. For this, detailed studies have been carried out using complementary methods such as X-ray diffraction (XRD), X-ray reflectivity (XRR), transmission electron microscopy (TEM) in cross-section as well as SDTrimSP simulations. Here, the most recent results obtained during growth of Ta2O5/ZrO2-multilayers leading to high quality MZPs are discussed. [1] Döring et al., Opt. Expr. 21 (2013); [2] Eberl et al., Appl. Surf. Sci. 307 (2014)