Berlin 2015 – scientific programme

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O: Fachverband Oberflächenphysik

O 37: Scanning Probe Techniques

O 37.2: Poster

Tuesday, March 17, 2015, 18:15–21:00, Poster A

Development of a Dedicated Lithographic System for Focused Electron Beam Induced Processing (FEBIP) — •Florian Vollnhals, Fan Tu, Martin Drost, Hans-Peter Steinrück, and Hubertus Marbach — Physikalische Chemie II, Friedrich-Alexander Universität Erlangen-Nürnberg, Egerlandstr. 3, D-91058, Erlangen.

Focused Electron Beam Induced Processing (FEBIP) subsumes a number of electron beam based lithographic techniques for the fabrication of nanostructures on surfaces, e.g. Electron Beam Induced Deposition (EBID) or Surface Activation (EBISA). In EBID, for example, a metal-organic precursor is dosed onto a surface and locally decomposed by a highly focused electron beam. Non-volatile fragments form a nanosize deposit while volatile ones are pumped off.^[1,2]

These techniques rely on precise spatio-temporal control of the electron beam, to which end a lithographic attachment for an UHV-SEM was developed. The system is based on commercially available DAC hardware and LabVIEW as a programming environment. We will discuss some of the beam control-related challenges that were encountered during FEBIP research using standard EBL systems and present the capabilities of the new setup using examples from EBID and EBISA studies under UHV conditions.

Supported by the DFG via grant MA 4246/2-1, the COST Action CM1301 (CELINA) and by the excellence cluster Engineering of Advanced Materials of the FAU Erlangen-Nürnberg.

^[1] W. van Dorp et al., J. Appl. Phys. 104 (2008), 0801301.

^[2] H. Marbach, Appl. Phys. A 117 (2014), 987.