Regensburg 2016 – scientific programme
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CPP: Fachverband Chemische Physik und Polymerphysik
CPP 47: Poster: Interfaces and Thin Films
CPP 47.11: Poster
Wednesday, March 9, 2016, 18:15–21:00, Poster B2
Morphological changes in diblock copolymer thin films in solvent vapor mixtures — •Florian Jung1, Anatoly V. Berezkin1, Detlef-M. Smilgies2, Dorthe Posselt3, and Christine M. Papadakis1 — 1Technische Universität München, Physik-Department, Garching, Germany — 2Cornell University, CHESS Wilson Lab, Ithaca, NY, U.S.A. — 3Roskilde University, Department of Science, Systems and Models, Denmark
Block copolymers self-assemble and form various morphologies. Thin films have been proposed for nanolithography. Solvent vapor annealing increases the mobility of the polymers, which can lead to an improved long-range order. In the present work, solvent vapor annealing was carried out using a mixture of vapors of two different solvents that both are selective for one block. Thin films from a cylinder-forming polystyrene-block-poly(dimethylsiloxane) diblock copolymer were prepared on Si wafers. The morphological changes were investigated by in-situ, real-time grazing-incidence small-angle X-ray scattering, varying the degree of swelling of the film, the mixing ratio of the two solvent vapors and temperature. Varying the solvent vapor composition systematically reveals a path dependence of the resulting morphology.