Regensburg 2016 – scientific programme

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DS: Fachverband Dünne Schichten

DS 16: Layer Properties: Electrical, Optical, and Mechanical

DS 16.13: Talk

Tuesday, March 8, 2016, 12:45–13:00, H11

Structural and optical properties of TiO2-films with thicknesses from 2 to 200 nm deposited with RF-diode sputtering — Jingyi Shi, •Sebastian Schippreit, Klaus Pärschke, and Dieter Mergel — Thin Film Technology Group, Faculty of Physics, University of Duisburg-Essen

TiO2-films with thicknesses from 2 nm to 200 nm have been produced by rf-diode sputtering at various temperatures and their structural and optical properties have been studied. The optical properties of the films were obtained by simulation of their (NIR/UV/VIS) optical spectra with the computer program SCOUT. The films already show optical effects (absorptive and ellipsometric) at a thickness of 2 nm and the simulated film thicknesses suite well to the mechanically obtained values. Structural analysis was performed using X-ray diffraction, Raman spectroscopy and scanning electron microscopy. A phase change occurred in the TiO2-films from mainly rutile to a mixed rutile-anatase phase with increasing substrate temperature as well as with increasing film thickness.