Bremen 2017 – scientific programme
Parts | Days | Selection | Search | Updates | Downloads | Help
P: Fachverband Plasmaphysik
P 8: Plasma Diagnostics II
P 8.2: Fachvortrag
Tuesday, March 14, 2017, 08:55–09:20, HS 1010
A Calorimetric Study of Secondary Electrons in Sputtering and Nitriding PIII Processes — •Fabian Haase1, Stephan Mändl2, Darina Manova2, and Holger Kersten1 — 1Institute of Experimental and Applied Physics, CAU Kiel, Germany — 2Leibniz Institute of Surface Modification, Leipzig, Germany
Reactive deposition processes are commonly used in industry to achieve high quality coatings. Modern technologies including magnetron sputtering and HIPIMS crucially depend on plasma properties including SEE from surfaces exposed to the plasma or energetic ion bombardment. The latter one can actually lead to changes in surface composition due to preferential sputtering or ion implantation. This variation is usually not accessible by conventional measurements of secondary electron coefficients. In this work, an approach using a passive calorimetric probe to investigate the effect of different substrate surface states is presented using a PIII setup where energetic ions are accelerated to the substrate. In preparatory studies the energy flux from the substrate during a PIII pulse was determined which conclusively left only SEE as the only viable candidate for intense energy influx. In the present study we measured several materials and alloys (e.g. Al, AlMg3, Mg, MgAl9Zn1, Cu, Zn, Mo, Ti and stainless steel 304) starting from a fully oxidized substrate using Ar sputtering into a clean metal state and afterwards nitriding towards a fully nitrided substrate. Kinetics on the de-oxidizing and nitriding as well as relative secondary electron emission coefficients for the materials were obtained.