Bremen 2017 – wissenschaftliches Programm
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SYPO: Symposium Plasma und Optische Technologien
SYPO 4: Plasma und Optische Technologien II
SYPO 4.1: Hauptvortrag
Mittwoch, 15. März 2017, 16:20–16:45, GW1 HS
Diagnostics and Control Schemes for Industrial PIAD Processes — Jens Harhausen1, •Rüdiger Foest1, Christian Franke2, Olaf Stenzel2, Jochen Wauer1, and Steffen Wilbrandt2 — 1Leibniz Institute of Plasma Science and Technology, Felix-Hausdorff-Straße 2, D-17489 Greifswald — 2Fraunhofer Institute of Applied Optics and Precision Engineering, Albert-Einstein-Straße 7, D-07745 Jena
Plasma ion assisted deposition (PIAD) is an important tool for the production of interference optics on the industrial scale. This technique combines thermal or e-beam evaporation with plasma treatment of the film growth. The work focusses on characterization of plasma and film properties aiming at improved stability of the processes to finally result in enhanced quality, repeatability and yield. This contribution presents concepts of plasma diagnostics - optical emission spectroscopy and active plasma resonance spectroscopy - which are suited for industrial needs. Practical applications are exemplified. Based on the parameters radiance and electron density now being available during deposition, new strategies for process control have been developed and examined regarding their efficacy compared to conventional approaches. Results of deposition series of single and multilayer systems comprising the materials SiO2, Al2O3, Ta2O5 and TiO2 are discussed. Funded by German Federal Ministry of Education and Research under grants 13N13213 and 13N13214.