Dresden 2017 – wissenschaftliches Programm
HL 58.4: Vortrag
Mittwoch, 22. März 2017, 15:45–16:00, POT 151
Deterministic integration of quantum dots into on-chip waveguides and beamsplitters by in-situ electron beam lithography — •Peter Schnauber1, Oliver Kirsch1, Ronny Schmidt1, Arsenty Kaganskiy1, Andre Strittmatter2, Sven Rodt1, and Stephan Reitzenstein1 — 1Institut für Festkörperphysik, Technische Universität Berlin, Hardenbergstrasse 36, 10623 Berlin, Germany — 2Abteilung für Halbleiterepitaxie, Otto-von-Guericke Universität, 39106 Magdeburg, Germany
On-chip waveguides and beamsplitters have proven to be suitable to realize basic quantum logic circuits. Moreover, quantum dots (QDs) can be integrated into such on-chip elements to act as quantum light sources. In order to efficiently couple the QD’s emission into a waveguide, the QD’s lateral position inside a thin waveguide must be precisely controlled. When integrating multiple QDs in complex waveguide circuits it is important to preselect and fine-adjust their emission wavelength to achieve for instance two-photon interference which is necessary for quantum gate operation. A spatially and spectrally deterministic integration of QDs into waveguides can be achieved by in-situ electron beam lithography (EBL). By applying our method, QDs are preselected by means of helium-temperature cathodoluminescence spectroscopy right before waveguides and beamsplitters are patterned in-situ with the naturally high resolution of EBL. Special care is taken to optimize the surface roughness of such low-temperature-patterned structures.
 M. Gschrey et al., Nat. Commun. 6, 7662 (2016)