Berlin 2018 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 5: Layer Deposition (ALD, MBE, Sputtering, ...)
DS 5.5: Vortrag
Montag, 12. März 2018, 12:45–13:00, H 0111
Deposition-Flux dependent Intrinsic Film Stress: Scaling — •Marcel Rost1, Andreas Jamnig2, Clarisse Furgeaud2, and Gregory Abadias2 — 1Huygens-Kamerlingh Onnes Laboratory, Leiden University, Leiden, The Netherlands — 2Institut P, CNRS, Université de Poitiers, Poitiers, France
The growth of polycrystalline films at temperatures above ~0.2 of the melting temperature is accompanied by compressive stress development after film closure. A significant part of this stress has a reversible nature: it disappears when the deposition is stopped and re-emerges upon resumption. Based on the variation of the chemical potential of the surface, the grain boundaries, and the film, we have developed a thermodynamic description that predicts the magnitude of the reversible compressive stress [1], and that agrees so far with published experimental results.
Moreover, in analogy to the often observed scaling in growth phenomena, our model also predicts that the stress jumps are proportional to "deposition flux"/"surface mobility". Here we show the first experimental evidence for this scaling, which delivers additional proof for the validity of our model.
[1] A.Saedi and M.J. Rost; Nature Communications, 7:10733 (2016)