Berlin 2018 – scientific program

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KFM: Fachverband Kristalline Festkörper und deren Mikrostruktur

KFM 26: Lithography IV: Lithography and Structuring (joint session KFM/DS)

Thursday, March 15, 2018, 15:00–18:10, EMH 025

This second lithography session focuses mainly on the application of advanced methods for quantum applications and the fabrication of lower dimensional systems. With the mass production of transistors devices at the 10 nm level with transmissive optical masks and with extreme UV reflective masks being at the horizon for mass fabrication, the industrial photomask fabrication is currently facing a significant technology transition and new technology requirements needed to keep pace with. The session also looks into those industrial challenges. Finally, the session focuses on important characterization methods required for the above mentioned state-of-the art lithography methods and their characterization.

Organizer: Robert Kirchner - Technische Universität Dresden

15:00 KFM 26.1 Invited Talk: Electron Beam Lithography and Ion Beam Patterning for Applications in Quantum Technology — •Jörg Stodolka, Michael Kahl, Axel Rudzinski, and Sven Bauerdick
15:30 KFM 26.2 Technology for fabrication of suspended sub-5 nm silicon nanowires and applications thereafterNikolay Petkov, Dipjyoti Deb, Muhammad Bilal Khan, Artur Erbe, and •Yordan M. Georgiev
15:50 KFM 26.3 Photomask Manufacturing Technology - An Overview — •Christian Buergel, Torben Heins, and Martin Sczyrba
16:10 KFM 26.4 Simulation of Ion Beam induced Surface Dynamics — •Alrik Stegmaier and Hans Hofsäss
  16:30 20 min. break
16:50 KFM 26.5 NFFA-Europe: enhancing European competitiveness in nanoscience research and innovation — •Dimitrios Kazazis
17:10 KFM 26.6 Fresnel-Mirror-Setup for Interference Lithography — •Arrigo Facchini, Bodo Fuhrmann, Hartmut S. Leipner, Georg Schmidt, and Roland Scheer
17:30 KFM 26.7 Analysis of rough nanostructured surfaces by EUV-scatterometry — •Analía Fernández Herrero, Frank Scholze, and Victor Soltwisch
17:50 KFM 26.8 GISAXS reconstruction of profiles of gratings produced by quadruple patterning — •Mika Pflüger, Victor Soltwisch, R. Joseph Kline, Frank Scholze, and Michael Krumrey
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