Regensburg 2019 – scientific programme
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DS: Fachverband Dünne Schichten
DS 15: Focus Session: Direct-Write Nanofabrication and Applications I
(Electron Beam Induced Processing) (joint session DS/TT)
DS 15.2: Talk
Wednesday, April 3, 2019, 10:00–10:15, H32
Modeling FEBID frequency maps: Lateral deposit resolution and surface diffusion — •Jakub Jurczyk1,2, Czeslaw Kapusta2, and Ivo Utke1 — 1Empa, Swiss Federal Laboratories for Materials Science and Technology, Feuerwerkstrasse 39, CH-3602 Thun, Switzerland — 2AGH University of Science and Technology Krakow, Al. Mickiewicza 30, 30-059 Kraków, Poland
Focused electron beam induced deposition (FEBID) is governed by four main processes: adsorption, desorption, surface diffusion and dissociation of precursor molecules on the sample surface [1],[2]. All of them influence growth rate, lateral resolution and shape of deposited structures; hence we can distinguish four different deposition regimes: reaction-rate limited, mass transport limited, diffusion enhanced and the combination of the two latter [3]. In their recent work, Sanz-Hernandez et al. [4] visualized these regimes based on characteristic frequencies for every process, creating frequency maps for the growth rates and coverage [4]. In this contribution we expand this approach to include the lateral deposit resolution and the influence of surface diffusion into the frequency maps. Results of simulations will be discussed in the context of their physical basis and future designed experiments. [1] I. Utke et al., J. Vac. Sci. Technol. B, 26, (2008), 1197-1276; [2] M. Toth et al. Beilstein J. Nanotech., 6, (2015), 1518*1540[3]; A. Szkudlarek et al., Appl. Phys. A, 117, (2014), 1715*1726;[4] D. Sanz-Hernandez et al., Beilstein J. Nanotechnol., 8, (2017), 2151*2161