Regensburg 2019 – wissenschaftliches Programm
KFM 14.1: Poster
Mittwoch, 3. April 2019, 16:00–18:30, Poster C
Fabrication of polymeric Whispering-Gallery-Mode resonators on tunable liquid crystal elastomer substrates using Deep-UV — •Lukas Mall, Simon Woska, Jannis Hessenauer, Carolin Klusmann, Tobias Siegle, and Heinz Kalt — Institute of Applied Physics, Karlsruhe Institute of Technology, 76131 Karlsruhe, Germany
Whispering-Gallery-Mode (WGM) micro resonators offer huge potential for future applications in photonic devices. For many applications, a cheap and upscalable production is indispensable, which requires the development of reproducible and fast production processes. Polymers as resonator material open up the possibility to structure WGM resonators using Deep-UV lithography. This method allows parallel production of a large number of resonators at low costs.
Polymers also allow implementation of flexible photonic components like photonic molecules with a tunable inter-cavity gap. Such elements are achieved by structuring WGM resonators on flexible substrates. Especially promising substrates are made from liquid crystal elastomers (LCEs) which show thermally induced geometrical modifications.
In this contribution, we detail the production process of DUV-structured high-Q WGM resonators made from poly (methyl methacrylate) (PMMA) on LCE substrates. To overcome problems regarding stability, adhesion, process reliability etc., we employ stacked layers of several different polymers utilizing their very own characteristics.