Regensburg 2019 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 72: Poster Wednesday: Scanning Probe Techniques
O 72.3: Poster
Mittwoch, 3. April 2019, 17:45–20:00, Poster B2
Analysis and quantification of electrochemical strain in contact resonance atomic force microscopy — •Sebastian Badur, Thomas Göddenhenrich, and André Schirmeisen — Institut für Angewandte Physik, Justus-Liebig-Universität Gießen, D-35392
Contact resonance atomic force microscopy can be used to measure the electrochemical strain caused by ionic movement (Vegard strain).
These potential-induced local surface deformations strongly depend on ionic concentration, electric field distribution and diffusion time. Besides that, local electrochemical strain response is mostly superimposed by other local tip-sample contact mechanics from local and non-local electrostatic forces that contribute to the image contrast formation.
For measuring and quantifying electrochemical strain, we developed a method to eliminate these parasitic contributions by using band excitation in a low and high frequency regime of the cantilever excitation.
As sample, we use LixCoO2 as a typical battery cathode material. Contact resonance measurements and additional current measurements were done with conductive cantilevers and tips under UHV condition.