Hannover 2020 – wissenschaftliches Programm
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Q: Fachverband Quantenoptik und Photonik
Q 13: Posters: Quantum Optics and Photonics I
Q 13.38: Poster
Montag, 9. März 2020, 16:30–18:30, Empore Lichthof
Inverted plasmonic lens designs for ellipsometric form evaluations — •Tim Käseberg1, Jana Grundmann1, Thomas Siefke1, 2, Stefanie Kroker1, 3, and Bernd Bodermann1 — 1Physikalisch-Technische Bundesanstalt, 38116 Braunschweig, Germany — 2Friedrich-Schiller-Universität Jena, Institute of Applied Physics, 07743 Jena, Germany — 3Laboratory for Emerging Nanometrology, Technische Universität Braunschweig, 38106 Braunschweig, Germany
For a better sensitivity of polarization-based form information of nanostructures in Mueller matrix ellipsometry, we investigate the use of plasmonic lenses in ellipsometric setups. The classic plasmonic lens consists of a metallic slab with several nanoslits that function as waveguides for surface plasmon polaritons (SPPs). However, due to the need for narrow and deep slits leading to slab thicknesses of about 1 µm and slit widths around 10 - 100 nm, the fabrication of plasmonic lenses is challenging. We present a new design scheme, called inverted plasmonic lens, where instead of travelling through slits SPPs propagate through dielectric ridges with metallic sidewalls. The new design accommodates electron beam lithography, simplifying the fabrication process. In this contribution, we discuss this new design and compare it to the classic design. We used particle swarm optimization and finite element method to simulate lenses with different parameters to design a set of lenses for the application on varying regimes of wavelength and focal length. Additionally, we discuss the application of the inverted plasmonic lens in Mueller matrix microscopy for an advanced metrology of nanostructures with sub-wavelength sized features.