SKM 2021 – scientific programme
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CPP: Fachverband Chemische Physik und Polymerphysik
CPP 8: Poster Session III
CPP 8.28: Poster
Wednesday, September 29, 2021, 17:30–19:30, P
Fabricating high resolution nanostructures using polymethyl methacrylate and isopropanol water mixtures — •Stephanie Lake1, Frank Heyroth2, and Georg Schmidt1,2 — 1Institut für Physik, Martin-Luther-Universität Halle-Wittenberg, 06120 Halle, Germany — 2Interdisziplinäres Zentrum für Materialwissenschaften, MartinLuther-Universität Halle-Wittenberg, 06120 Halle, Germany
Electron beam lithography (EBL) can produce high resolution structures but has its drawbacks. Compared to photolithography, it takes more time and has lower throughput. An ideal EBL procedure would require lower exposure dose and withstand environmental fluctuations. Establishing a ”process window ” (PW) quantifies such requirements.
In this poster, we define a primary PW for polymethyl methacrylate (PMMA) during the developer stage. The area dose is varied and the range where there is sufficient development is subsequently identified. Isopropanol (IPA) and water mixtures can decrease the exposure dose needed for full development compared to other standard PMMA developers1. Thus, we defined yet another PW by varying the IPA concentration and measuring the aforementioned, primary PW.
From this work, we discovered mixtures of 69% to 77% IPA can require lower exposure doses than pure IPA. With 73% IPA, the required dose can be up to 82.9% less than that for pure IPA. We show it is feasible to use this developer for high resolution structures without compromising reproducibility.
1Mohsin, M. A. & Cowie, J. M. G. Polymer (Guildf). 29, 2130-2135 (1988).